Linguistische Arbeiten

Band 460:
Neef, Martin / Neijt, Anneke / Sproat, Richard (Hrsg.): The Relation of Writing to Spoken Language. VI/210 S. - Tübingen: Niemeyer, 2002.
ISBN: 3-484-30460-X

Dieser Band ist im IDS verfügbar:

[Buch] IDS-Bibliothek: Sig. QF 995
Alternatives Medium:
E-Book (PDF). Berlin / New York: de Gruyter. ISBN: 978-3-11-091860-1

This volume grew out of the workshop Writing Language, held at the Max Planck Institute, Nijmegen. The papers represent several lines of research into the intricate relation between writing and spoken language: Theoretical and computational linguists discuss the models that explain why orthographies are the way they are and the constraints that hold between writing and speaking a language; researchers in special education deal with the question of how certain aspects of orthography can be learned; and psycholinguists discuss aspects of language processing affected by variation in orthographies.


Neef, Martin / Neijt, Anneke / Sproat, Richard:
  Introduction S. 1
Section 1: Consistency
Neijt, Anneke:
  The Interfaces of Writing and Grammar S. 11
Sproat, Richard:
  The Consistency of the Orthographically Relevant Level in Dutch S. 35
Section 2: Cross-Linguistic Studies
Borgwaldt, Susanne R. / de Groot, Annette M. B.:
  Beyond the Rime: Measuring the Consistency of Monosyllabic and Polysyllabic Words S. 49
Gillis, Steven / Ravid, Dorit:
  Teachers' Perception of Spelling Patterns and Children's Spelling Errors: A Cross-Linguistic Perspective S. 71
Section 3: Diacritics and Punctuation
van Heuven, Vincent J.:
  Effects of Diaeresis on Visual Word Recognition in Dutch S. 99
Geilfuß-Wolfgang, Jochen:
  Optimal Hyphenation S. 115
Bredel, Ursula:
  The Dash in German S. 131
Noack, Christina:
  Regularities in German Orthography: A Computer-Based Comparison of Different Approaches to Sharpening S. 149
Neef, Martin:
  The Reader's View: Sharpening in German S. 169
Lindauer, Thomas:
  How Syllable Structure affects Spelling: A Case Study in Swiss German Syllabification S. 193
Addresses of Contributors S. 209